project . 2019 - 2024 . On going

EUVPLASMA

Laser-driven plasma sources of extreme ultraviolet light for nanolithography
Open Access mandate for Publications European Commission
  • Funder: European CommissionProject code: 802648 Call for proposal: ERC-2018-STG
  • Funded under: H2020 | ERC | ERC-STG Overall Budget: 1,500,000 EURFunder Contribution: 1,500,000 EUR
  • Status: On going
  • Start Date
    01 Feb 2019
    End Date
    31 Jan 2024
  • Detailed project information (CORDIS)
  • Open Access mandate
    Research Data: No
Description
Moore’s law is not dead. Keeping it alive is of significant importance to society and to the economy. The prediction that the number of transistors in computer and memory chips doubles every two years, has pushed innovative, disruptive technologies, enabling the smartphone and driving tomorrow’s green automotive industries. It changes society. The density of elements realized on a chip is defined by one essential step in their production: lithography. Moore’s law thus provides a challenge to science and industry to develop beyond state of the art lithographic technologies. This challenge is being met by introducing extreme ultraviolet (EUV) lithography in high-v...
Partners
Description
Moore’s law is not dead. Keeping it alive is of significant importance to society and to the economy. The prediction that the number of transistors in computer and memory chips doubles every two years, has pushed innovative, disruptive technologies, enabling the smartphone and driving tomorrow’s green automotive industries. It changes society. The density of elements realized on a chip is defined by one essential step in their production: lithography. Moore’s law thus provides a challenge to science and industry to develop beyond state of the art lithographic technologies. This challenge is being met by introducing extreme ultraviolet (EUV) lithography in high-v...
Partners
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